Woo, Sang-Gyun: шукати на сайті Z-Library

Найбільша колекція наукових статей у сіті. 70,000,000+ безкоштовних статей.

Пожертвування 15 вересня 2024 – 1 жовтня 2024

Z-Library - одна з найбільших онлайн-бібліотек у світі, в якій зберігається більше 17,000,000 книг та 84,837,000 статей. Ми намагаємось зробити літературу доступною кожному. Сьогодні (15 вересня 2024) ми відкриваємо додатковий збір пожертвувань на підтримку та розвиток проекту.

Також БЕЗЛІМТНІ завантаження (протягом 31 дня після завершення пожертвування) доступні для ВСІХ користувачів, які підтримають проект в період збору коштів до 1 жовтня 2024.

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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Design and performance of photoresist materials for ArF lithography

Kim, Hyun-Woo, Jung, Dong-Won, Lee, Sook, Choi, Sang-Jun, Woo, Sang-Gyun, Kavanagh, Robert J., Barclay, George G., Blacksmith, Robert F., Kang, Doris, Pohlers, Gerd, Cameron, James F., Mattia, Joe, Ca

Рік:

2001

Мова:

english

Файл:

PDF, 330 KB

english, 2001

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Plasma monitoring of chrome dry etching for mask making

Kwon, Sung-Won, Montgomery, M. Warren, Maurer, Wilhelm, Kim, Dong-Chan, Nam, Dong-Seok, Woo, Sang-Gyun, Cho, Han-Ku

Рік:

2010

Мова:

english

Файл:

PDF, 596 KB

english, 2010

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Lee, Ji-Young, Shin, Jangho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Sturtevant, John L.

Рік:

2004

Мова:

english

Файл:

PDF, 174 KB

english, 2004

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Novel chemical shrinkage material for small contact hole and small space patterning

Hata, Mitsuhiro, Sturtevant, John L., Hah, Jung-Hwan, Kim, Hyun-Woo, Ryoo, Man-Hyoung, Woo, Sang-Gyun, Cho, Han-Ku

Рік:

2005

Мова:

english

Файл:

PDF, 613 KB

english, 2005

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography

Hong, Sungeun, Takano, Yusuke, Kanda, Takashi, Kudo, Takanori, Padmanaban, Munirathna, Tanaka, Hatsuyuki, Lee, Si-Hyeung, Lee, Jung-Hyeon, Woo, Sang-Gyun, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 871 KB

english, 2003

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Era of double exposure in 70 nm node DRAM cell

Kim, Sang-Jin, Smith, Bruce W., Park, Joon-Soo, Kim, Tae-Young, Kim, Byeong-Soo, Yeo, Gi-Sung, Oh, Seok-Hwan, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2005

Мова:

english

Файл:

PDF, 3.10 MB

english, 2005

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Chalykh, Roman, Silver, Richard M., Kim, Seong-Sue, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2005

Мова:

english

Файл:

PDF, 229 KB

english, 2005

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication

Jung, Myoung-Ho, Sturtevant, John L., Kim, Hyun-Woo, Hong, Jin, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 2.66 MB

english, 2004

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Design and synthesis of new photoresist materials for ArF lithography

Choi, Sang-Jun, Kim, Hyun-Woo, Woo, Sang-Gyun, Moon, Joo-Tae, Houlihan, Francis M.

Рік:

2000

Мова:

english

Файл:

PDF, 1.50 MB

english, 2000

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Evaluation of puddle time effect and optimization of development process in 193-nm lithography

Lee, Hyung-Rae, Sturtevant, John L., Shin, Jangho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 830 KB

english, 2004

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Comprehensive analysis of sources of total CD variation in ArF resist perspective

Kim, Hyun-Woo, Sturtevant, John L., Lee, Hyung-Rae, Kim, Kyung-Mee, Lee, Shi Yong, Kim, Bong-Cheol, Oh, Seok-Hwan, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 2.32 MB

english, 2004

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Modification of development parameters of 193-nm chemically amplified resist with pattern density

Seo, Eun-Jung, Sohn, Young-Soo, Bak, Heungin, Oh, Hye-Keun, Woo, Sang-Gyun, Seong, Nakgeuon, Cho, Hanku, Houlihan, Francis M.

Рік:

2001

Мова:

english

Файл:

PDF, 283 KB

english, 2001

Pattern Collapse Improvement in ArF Resist: Effect of Surfactant-added Rinse and Soft Bake

Jung, Myoung-Ho, Kim, Hyun-Woo, Lee, Sung-Ho, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Журнал:

Journal of Photopolymer Science and Technology

Рік:

2003

Файл:

PDF, 627 KB

2003

Photobleaching Photoacid Generator.

Kim, Jin-Baek, Jang, Ji-Hyun, Kim, Hyun-Woo, Woo, Sang-Gyun

Журнал:

Journal of Photopolymer Science and Technology

Рік:

2001

Мова:

english

Файл:

PDF, 234 KB

english, 2001

Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation

Zhong-Tao Jiang, Seungbum Hong, Eunah Kim, Byeong-Soo Bae, Sungchul Lim, Sang-Gyun Woo, Young-Bum Koh, Kwangsoo No

Журнал:

Applied Surface Science

Рік:

1997

Мова:

english

Файл:

PDF, 413 KB

english, 1997

Effects of gas ring position and mesh introduction on film quality and thickness uniformity

Seungbum Hong, Eunah Kim, Zhong-Tao Jiang, Byeong-Soo Bae, Kwangsoo No, Sung-Chul Lim, Sang-Gyun Woo, Young-Bum Koh

Журнал:

Materials Science and Engineering: B

Рік:

1997

Мова:

english

Файл:

PDF, 441 KB

english, 1997

The Role of Surgery After Incomplete Endoscopic Mucosal Resection for Early Gastric Cancer

Yoo Seung Chung, Do-Joong Park, Hyuk-Joon Lee, Sang-Gyun Kim, Hyun-Chae Jung, In-Sung Song, Woo-Ho Kim, Kuhn-Uk Lee, Kuk-Jin Choe, Han-Kwang Yang

Журнал:

Surgery Today

Рік:

2007

Мова:

english

Файл:

PDF, 135 KB

english, 2007

Experimental investigation of the impact of LWR on sub-100-nm device performance

Hyun-Woo Kim, Ji-Young Lee, Shin, J., Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Журнал:

IEEE Transactions on Electron Devices

Рік:

2004

Мова:

english

Файл:

PDF, 714 KB

english, 2004

Simulation and fabrication of attenuated phase-shifting masks: CrF_x

Kim, Eunah, Hong, Seungbum, Kim, Kyong-Sub, Jiang, Zhong-Tao, Kim, Dae Weon, Lim, Sungchul, Woo, Sang-Gyun, Koh, Young-Bum, No, Kwangsoo

Журнал:

Applied Optics

Рік:

1997

Мова:

english

Файл:

PDF, 384 KB

english, 1997

Attenuated Phase-Shifting Masks of Chromium Aluminum Oxide

Kim, Eunah, Hong, Seungbum, Lim, Sungchul, Kim, Yong-Beom, Woo, Sang-Gyun, Kim, Dae-Weon, No, Kwangsoo

Журнал:

Applied Optics

Рік:

1998

Мова:

english

Файл:

PDF, 197 KB

english, 1998

SPIE Proceedings [SPIE 22nd European Mask and Lithography Conference - Dresden, Germany (Monday 23 January 2006)] 22nd European Mask and Lithography Conference - Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Lee, Sung-Woo, Leunissen, Leonardus H. A., Van de Kerkhove, Jeroen, Philipsen, Vicky, Jonckheere, Rik, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae, Behringer, Uwe F. W.

Рік:

2006

Мова:

english

Файл:

PDF, 417 KB

english, 2006

[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Etching characteristics of fine Ta patterns with electron cyclotron resonance chlorine plasma

Sang Hoon Kim,, Sang-Gyun Woo,, Jinho Ahn,

Рік:

2000

Мова:

english

Файл:

PDF, 260 KB

english, 2000

[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Most efficient alternative as a way of sub-80 nm contact holes and trenches formation

Jung Hwan Hah,, Jin-Young Yoon,, Hata Mitsuhiro,, Hyun-Woo Kim,, Sang-Gyun Woo,, Han-Ku Cho,, Woo-Sung Han,

Рік:

2003

Мова:

english

Файл:

PDF, 105 KB

english, 2003

[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Formation of sub-100 nm contact hole patterns using a novel resist material

Sang-Jun Choi,, Yool Kang,, Jeong-Hee Chung,, Sang-Gyun Woo,, Joo-Tae Moon,

Рік:

2000

Мова:

english

Файл:

PDF, 216 KB

english, 2000

Laparoscopic management of hypertrophic hypersecretory gastropathy with protein loss: A case report

Byun, Jeik, Kwon, Sebastianus, Oh, Seung-Young, Lee, Kyung-Goo, Suh, Yun-Suhk, Kong, Seong-Ho, Kim, Sang-Gyun, Kim, Woo-Ho, Yang, Han-Kwang, Lee, Hyuk-Joon

Журнал:

Asian Journal of Endoscopic Surgery

Рік:

2014

Мова:

english

Файл:

PDF, 779 KB

english, 2014

Etching Characteristics of Fine Ta Patterns with Electron Cyclotron Resonance Chlorine Plasma

Woo, Sang-Gyun, Kim, Sang Hoon, Ju, Sup-Youl, Son, Joo-Hiuk, Ahn, Jinho

Журнал:

Japanese Journal of Applied Physics

Рік:

2000

Мова:

english

Файл:

PDF, 900 KB

english, 2000

Flare in Microlithographic Exposure Tools

Jeong, Tae Moon, Choi, Sung-Woon, Park, Jong Rak, Ki, Won-Tai, Sohn, Jung-Min, Lee, Sung-Woo, Kang, Hyun-Jae, Woo, Sang-Gyun, Han, Woo-Sung

Журнал:

Japanese Journal of Applied Physics

Рік:

2002

Мова:

english

Файл:

PDF, 287 KB

english, 2002

Which Mask is Preferred for Sub-60 nm Node Imaging?

Kim, Sung-Hyuck, Kim, Soon-Ho, Kim, Yong-Hoon, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Oh, Hye-Keun

Журнал:

Japanese Journal of Applied Physics

Рік:

2007

Мова:

english

Файл:

PDF, 543 KB

english, 2007

Measurement of the strength of adhesion of resist patterns using an atomic force microscope

Kim, Sung-Kyoung, Jung, Myoung-Ho, Kim, Hyun-Woo, Woo, Sang-Gyun, Lee, Haiwon

Журнал:

Nanotechnology

Рік:

2005

Мова:

english

Файл:

PDF, 1.37 MB

english, 2005

Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography

Jiang, Zhong-Tao, Hong, Seungbum, Kim, Eunah, Bae, Byeong-Soo, No, Kwangsoo, Hwangbo, Chang Kwon, Lim, Sung-Chul, Woo, Sang-Gyun, Koh, Young-Bum

Журнал:

Semiconductor Science and Technology

Рік:

1996

Мова:

english

Файл:

PDF, 128 KB

english, 1996

Is preoperative staging enough to guide lymph node dissection in clinically early gastric cancer?

Xu, Jia, Cao, Hui, Yang, Jun-Young, Suh, Yun-Suhk, Kong, Seong-Ho, Kim, Se-Hyung, Kim, Sang-Gyun, Lee, Hyuk-Joon, Kim, Woo-Ho, Yang, Han-Kwang

Журнал:

Gastric Cancer

Рік:

2016

Мова:

english

Файл:

PDF, 671 KB

english, 2016

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes

Lim, Sung-Chul, Kye, Jongwook, Woo, Sang-Gyun, Kim, Sunggi, Kang, Hoyoung, Han, Woo-Sung, Koh, Young-Bum, Fuller, Gene E.

Рік:

1996

Мова:

english

Файл:

PDF, 596 KB

english, 1996

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Fluorocarbon-based single-layer resist for 157-nm lithography

Song, Ki-Yong, Yoon, Kwang-Sub, Choi, Sang-Jun, Woo, Sang-Gyun, Han, Woo-Sung, Lee, Jae-Jun, Lee, Sang-Kyun, Noh, Chang-Ho, Honda, Kenji, Fedynyshyn, Theodore H.

Рік:

2002

Мова:

english

Файл:

PDF, 407 KB

english, 2002

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device

Choi, Jin, Hosono, Kunihiro, Lee, Sang Hee, Kim, Hee Bom, Kim, Byung Gook, Woo, Sang-Gyun, Cho, Han Ku

Рік:

2010

Мова:

english

Файл:

PDF, 330 KB

english, 2010

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - A new paradigm for haze improvement: retardation of haze occurrence by creating mask substrate insensitive to chemical contamination level

Lee, Han-Shin, Kawahira, Hiroichi, Zurbrick, Larry S., Choi, Jaehyuck, Jung, Jin-Sik, Oh, Jong-Keun, Kang, Soo-Jung, Jeong, Hae-Young, Woo, Sang-Gyun, Cho, HanKu

Рік:

2008

Мова:

english

Файл:

PDF, 1004 KB

english, 2008

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Novel resist material for sub-100-nm contact hole pattern

Chung, Jeong Hee, Choi, Sang-Jun, Kang, Yool, Woo, Sang-Gyun, Moon, Joo-Tae, Houlihan, Francis M.

Рік:

2000

Мова:

english

Файл:

PDF, 1.75 MB

english, 2000

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Impact of illumination intensity profile on lithography simulation

Hwang, Chan, Smith, Bruce W., Kim, In-sung, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 152 KB

english, 2004

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Validation of ArF Chromeless PSM in the Sub-100 nm Node DRAM Cell

Lee, Ju-Hyung, Chung, Dong-Hoon, Cha, Dong-Ho, Kim, Ho-Chul, Park, Joon-Soo, Nam, Dong-Seok, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Grenon, Brian J., Kimmel, Kurt R.

Рік:

2002

Мова:

english

Файл:

PDF, 989 KB

english, 2002

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone

Kim, Hyun-Woo, Choi, Sang-Jun, Jung, Dong-Won, Lee, Sook, Lee, Sung-Ho, Kang, Yool, Woo, Sang-Gyun, Moon, Joo-Tae, Kavanagh, Robert J., Barclay, George G., Orsula, George W., Mattia, Joe, Caporale, St

Рік:

2001

Мова:

english

Файл:

PDF, 578 KB

english, 2001

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Requirement of in-field illumination control for low k1 imaging below 0.3

Hwang, Chan, Smith, Bruce W., Shin, Jangho, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2005

Мова:

english

Файл:

PDF, 157 KB

english, 2005

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - The study of CD error in mid-local pattern area caused by develop loading effect

Kang, Man-Kyu, Naber, Robert J., Kawahira, Hiroichi, Lee, Jung-Hun, Kim, Seong-Yoon, Kim, Byung-Gook, Woo, Sang-Gyun, Cho, Han-Ku

Рік:

2007

Мова:

english

Файл:

PDF, 272 KB

english, 2007

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Impact of BARC on SEM shrinkage of ArF resist

Lee, Shi Yong, Sturtevant, John L., Kim, Myungsun, Yoon, Sangwoong, Kim, Kyung-Mee, Kim, Jae Hyun, Kim, Hyun-Woo, Woo, Sang-Gyun, Kim, Young Ho, Chon, Sang-Mun, Kishioka, Takahiro, Sone, Yasuhisa, Nak

Рік:

2004

Мова:

english

Файл:

PDF, 921 KB

english, 2004

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Kim, Seong-Sue, Mackay, R. Scott, Chalyck, Roman, Woo, Sang-Gyun, Cho, Han-Ku

Рік:

2005

Мова:

english

Файл:

PDF, 117 KB

english, 2005

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Toward DFM: process worthy design and OPC through verification method using MEEF, TF-MEEF, and MTT

Kim, In-Sung, Wong, Alfred K. K., Singh, Vivek K., Suh, Sungsoo, Jung, Sunggon, Lee, Eunmi, Kang, Young-Seog, Lee, Sukjoo, Woo, Sang-Gyun, Cho, HanKu

Рік:

2006

Мова:

english

Файл:

PDF, 1013 KB

english, 2006

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - 2D measurement using CD SEM for arbitrarily shaped patterns

Lee, Hyung-Joo, Naber, Robert J., Kawahira, Hiroichi, Bae, So-Yoon, Chung, Dong-Hoon, Woo, Sang-Gyun, Cho, HanKu, Matsumoto, Jun, Nakamura, Takayuki, Shin, DongIl, Kim, TaeJun

Рік:

2007

Мова:

english

Файл:

PDF, 1.63 MB

english, 2007

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Most feasible curing process for ArF resists in device integration aspect

Kim, Hyun-Woo, Kang, Yool, Lee, Ju-Hyung, Chae, Yun-Sook, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 1.31 MB

english, 2003

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Improvement of pattern collapse in sub-100 nm nodes

Jung, Myoung-Ho, Lee, Sung-Ho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 83 KB

english, 2003

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Improving model-based OPC performance for sub-60nm devices using real source optical model

Jung, Sunggon, Wong, Alfred K. K., Singh, Vivek K., Kim, In-Sung, Kang, Young-Seog, Yeo, Gi-Sung, Woo, Sang-Gyun, Cho, HanKu, Moon, Joo-Tae

Рік:

2006

Мова:

english

Файл:

PDF, 773 KB

english, 2006

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Requirements of nano-machining repair system for 45-nm node

Lee, Sang-Hyeon, Kim, Hwa-Sung, Shim, Hong-Seok, Lee, Su-Young, Kim, Geun-Bae, Kwon, Hyuk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Watanabe, Hidehiro

Рік:

2007

Мова:

english

Файл:

PDF, 483 KB

english, 2007

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Full-chip-based subresolution assist features correction for mask manufacturing

Bang, Ju-Mi, Naber, Robert J., Kawahira, Hiroichi, Masumoto, Issei, Ji, Min-Kyu, Jang, Sung-Hoon, Aburatani, Isao, Choi, Ji-Hyun, Woo, Sang-Gyun, Cho, Han-Ku

Рік:

2007

Мова:

english

Файл:

PDF, 885 KB

english, 2007